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US Chip Bill Revised, Still Targets ASML DUV Machines
16 Apr
Summary
- A U.S. bill to restrict Chinese chipmaking has been scaled back.
- New restrictions target ASML's deep ultraviolet immersion machines.
- The bill aims to align allied nations' tech controls on China.
The United States has introduced a revised bill, the "MATCH Act," designed to curb China's access to advanced chipmaking equipment. Initially proposed in early April, the legislation has undergone changes to address industry concerns, though it retains significant restrictions. The latest draft continues to target ASML's deep ultraviolet (DUV) immersion lithography machines, a critical technology dominated by the Netherlands-based company. This move aims to prevent these advanced tools from reaching Chinese chip manufacturers, including CXMT, YMTC, and SMIC, especially for facilities already barred from using American technology.
The "Multilateral Alignment of Technology Controls on Hardware Act" (MATCH) seeks to harmonize export controls on technology with allied nations such as Japan and the Netherlands. This effort is part of a broader strategy to maintain U.S. leadership in artificial intelligence, which is seen as transformative for global power dynamics. While earlier versions of the bill faced significant backlash from the industry due to its expansive reach, the revised version removes some countrywide curbs on other types of chipmaking equipment.
The bill is progressing through the U.S. legislative process, with the House Foreign Affairs Committee scheduled to vote on it soon. The U.S. has been working to align its semiconductor equipment controls with allies since late 2022, aiming for a more unified stance against China's technological advancement. China has stated its opposition to what it views as an overextension of U.S. national security concepts and a technological blockade.
