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German Firm: China Faces 15-Year Chipmaking Gap
3 Sep
Summary
- China lags significantly in advanced chipmaking tool development.
- A key supplier estimates a 15-year gap for EUV technology.
- This delay impacts China's self-sufficiency goals in semiconductors.

A leading executive from Germany's Zeiss Group has stated that China is about 15 years behind in developing crucial, cutting-edge chipmaking tools. Zeiss, a vital supplier to the global semiconductor sector, believes Beijing's timeline for developing extreme ultraviolet (EUV) lithography technology is a reasonable assumption to take approximately 15 years.
This significant technological lag presents a considerable obstacle for China's stated goals of achieving greater self-sufficiency in the semiconductor industry. The development of EUV technology is critical for manufacturing the most advanced microchips, and China's current capabilities fall considerably short of international leaders.