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ASML to Boost Chipmaking Power for Nvidia's GPUs
8 Sep
Summary
- ASML plans advanced tools for large data center chips.
- New High NA EUV tools will enable larger chip printing.
- TSMC and Samsung target 2028 for High-NA EUV integration.
ASML, the Dutch firm specializing in chip manufacturing equipment, is set to collaborate with its major customers to produce its most sophisticated lithography tools. These tools are intended for the development of large data center chips, similar to those designed by Nvidia and others.
The company's upcoming "High NA" EUV tools are designed to print chips with finer features. However, they currently face limitations in chip size due to a smaller mask. ASML is working on increasing the mask size for these new machines.
This enhancement is expected to facilitate wider adoption of High NA tools for high-volume production. While Intel is already utilizing these tools for laptop chips, major manufacturers like TSMC and Samsung are planning integration for advanced node production and DRAM memory chips by 2028 and 2030, respectively.
ASML aims to showcase a pilot line featuring these larger masks by 2031, with full high-volume production readiness anticipated by 2033. This development is projected to boost system productivity by 40% for the industry.
